ADVANCED ANALYSIS / TEST

FIB

    FIB

    • Cross Section Analysis
    • Dual Beam FIB – Features two types of FIB/FE-SEM together for precision cross-sectional analysis.
    • Ion Beam can be injected to plant microscopic regions in nm to um, and the etched regions can be used to obtain high-resolution images.
    • It is equipped with FIB and FE-SEM to enable etching and image observation at the same time, effectively performing analysis time and real-time inspection.

    Apply Analysis

    • Section Image
    • Section Analysis in nm ~ um

    Equipment Specifications

    Analytical equipment details
    Manufacturer/Model Name : 1540 EsB / CARL ZEISS
    1. Resolution : 7nm @ 30kV guaranteed, 5mm achievable
    2. Magnifcation : 600x - 500kx
    3. Probe Current : 1pA - 50 nA
    4. Emitter : Ga liquid metal ion source(LMS)
    5. Detectors : In-column : Esb with fitering grid(BSE) Fitering grid voltage 0 - 1500V
    6. Operating pressure : 5 x 10 - 5 mbar or lower
    7. Specimen Stage : 6-axes fuly exxentric, all motorized
    8. Gas Injection System : Up to 5 gases for selecive Etching, enhanced etching, material deposition, Insulator deposition

    Analysis Examples

    • Defective Location Section Analysis
    • Layer Thickness Measurement
    • Bump Section Structure